| abstract |
The invention discloses a method for gold film modification of an atomic force microscope probe by magnetron sputtering. The method consists of: by means of magnetron sputtering, depositing a Cr film and an Au film on a cleaned atomic force microscope probe (silicon or silicon nitride) in order under room temperature; and changing the thickness of the Cr film and the Au film by changing the sputtering time, thus finally obtaining the atomic force microscope probe covered with a Cr film of 3-20nm and an Au film of 30-100nm. And the probe can be used in microcosmic science and other fields. As the magnetron sputtering method has the advantages of simple equipment, film uniformity, fast deposition speed, and applicability for large area film making, etc., the method disclosed in the invention can be widely used in industrial production. |