| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2011-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2016-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-102763039-B |
| titleOfInvention |
Comprise the topcoat compositions of polymer containing the repetitive including sulfonamide functionality, containing its photoetching compositions and using method thereof |
| abstract |
Present invention provide for the compositions containing sulfonamide, coat polymer and the additive polymer of photoetching process, it has the static receding water contact angle of improvement for known in the art.The coat polymer containing sulfonamide of the present invention and additive polymer comprise the repetitive of the sulfonamide substitutions with branched linking group as shown in formula (I). |
| priorityDate |
2010-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |