http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102755976-B

Outgoing Links

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0206
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32541
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
filingDate 2008-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2016-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2016-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-102755976-B
titleOfInvention Substrate cleaning chamber and clean and control method
abstract Board cleaning chamber comprises the profile top electrode with arcuate surface, described arcuate surface is in the face of substrate support and have variable tranverse sectional thickness, provides well the variable plasma density across substrate support with the gap length changing between arcuate surface and substrate support. The dielectric collar of clean room comprise bottom, spine and covered substrate support member peripheral lip radially to internal frame portion. Bottom baffle comprises the circular discs with at least one peripheral wall. Describe the clean of clean room simultaneously and regulated processing.
priorityDate 2007-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 28.