http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102755898-B

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-86
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J23-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J23-888
filingDate 2012-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2014-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee3865332a05364c7cfd15ffcec8e13d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a633ea76c5123aa76ff1e2cbc380f13c
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publicationDate 2014-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-102755898-B
titleOfInvention Semiconductor control rectifier (SCR) denitration catalytic agent applicable to high ash-laden gas condition and preparation method thereof
abstract The invention relates to a semiconductor control rectifier (SCR) denitration catalytic agent applicable to a high ash-laden gas condition and a preparation method thereof and belongs to the technical field of catalysis. A surface active agent, a sizing agent, a lubricating agent and the like are added when a vanadium tungsten titanium system denitration catalytic agent is prepared, a secondary micro structure and reasonable pore diameter distribution are formed through secondary drying and burning, and the SCR denitration catalytic agent applicable to the high ash-laden gas condition is prepared. The bore diameter of prepared denitration catalytic agent is no less than 6.4mm, extrusion pressure at extrusion molding is small, surface is smooth, frictional factor is small, adherence of dust on the surface of the catalytic agent is difficult, clogging and poisoning risks of the honeycomb-type catalytic agent under the high ash-laden gas condition are reduced, added metallic oxide further improves anti-poisoning capability of the catalytic agent, adaptability of the denitration catalytic agent under the high ash-laden gas condition is improved, and the denitration catalyst technology breaks through under the high ash-laden gas condition.
priorityDate 2012-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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