http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102747426-B

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d6a6f422b091ba12ea61d4adbf1b0e8e
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B33-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-32
filingDate 2012-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2015-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_568a7e83d8607cf71d996416507b7b41
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d5249b11de2919e30279694e44a9b838
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publicationDate 2015-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-102747426-B
titleOfInvention Texture liquid for preparing submicron suede-like monocrystalline silicon wafer and preparation method thereof
abstract The invention discloses texture liquid for preparing a submicron suede-like monocrystalline silicon wafer and a preparation method thereof. The texture liquid comprises the following components: inorganic base, lower alcohol, an anion or non-ionic surfactant and the balance of deionized water. The preparation method of the texture liquid comprises the following steps of: adding the deionized water into a texture etching groove; sequentially adding the inorganic base, the lower alcohol and the anion or non-ionic surfactant under the stirring condition; and continuously stirring for 10 to 30 minutes to ensure the raw materials to be sufficiently dissolved and mixed. A uniform and submicron pyramid structure can be formed on the surface of the silicon wafer by the texture liquid; and the texture liquid has high coverage rate, excellent texture effect and simple process and is easy to implement.
priorityDate 2012-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 40.