http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102692819-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-202 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1339 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2012-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-102692819-B |
| titleOfInvention | Photosensitive polymer combination and liquid crystal board |
| abstract | The present invention provides the photosensitive polymer combination that a kind of ageing stability excellence and coated film thickness are difficult to change over and change and the liquid crystal board with the sept formed by this photosensitive polymer combination.The photosensitive polymer combination of the present invention contains alkali soluble resin (A), photopolymerization monomer (B), Photoepolymerizationinitiater initiater (C) and solvent (S).Wherein, alkali soluble resin (A) is containing the copolymer (A1) at least obtained by unsaturated carboxylic acid (a1) and unsaturated compound (a2) polyreaction with ester ring type epoxy radicals.Further, solvent (S) contains (gathering) alkylene glycol dialkylether kind solvent, and (gathering) alkylene glycol dialkylether kind solvent ratio shared by solvent (S) is more than 56 mass %. |
| priorityDate | 2011-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 386.