http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102686780-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_224cdefab5772d416bb3dedf4b4c7378 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3245 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G1-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C22-78 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F17-00 |
| filingDate | 2010-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_122609a6c2376f79ce38397db1667c3f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b2f520491505f77499184ec62df7dc5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c1ffb0c3876b41e3e54caeb3e57f98bc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c5cc359addafcae1d89af2ebf8b5c34 |
| publicationDate | 2015-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-102686780-B |
| titleOfInvention | Pretreatment process for aluminum and high etch cleaner used therein |
| abstract | Disclosed is a high etch cleaner for aluminum and aluminum alloy substrates that leads to enhanced corrosion protective performance of a variety of anti-corrosion pretreatments. The cleaner comprises very low levels of silicate of from 0 to 250 ppm, 50 to 500 ppm of at least one chelator selected from EDTA or its salts, NTA or its salts, DTPA or its salts, iminodisuccinic acid or its salts, EDDS or its salts, tartaric acid or its salts, or a mixture thereof, and has a high pH of from 11.0 to 13.5. Preferably the cleaner is used to etch from 0.5 to 4.0 grams per meter squared from the substrates.; Substrates treated with the cleaner and then coated with a variety of anti-corrosion pretreatments and outer coatings show enhanced corrosion resistance compared to substrates cleaned with standard cleaners that have low etch rates, high silicate levels and no chelating agents followed by anti-corrosion pretreatments and outer coatings. |
| priorityDate | 2009-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 77.