http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102643990-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ac31afbea1cbbb03498644721ffb4a62 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P10-20 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B23-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J47-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J45-00 |
| filingDate | 2012-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ede38521a4f2b5499cefa081dcadfd0e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9aba3359a07b673be21242e142756460 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c1b6ab6cfc97a5b7556afaa128ab0fe http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0fb237f03341c0c5e5b8f9d7e2b377df http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_125fd318f7c7b7d50e20ca6b6b3f3113 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af956288b75e30f329c9fd3c0671e2c3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbe5c32010d5eae1c88e22a8deb740fc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a7365862e4bfd317e5b92f5a6c8ebd3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e8d42fc7ca446073c0a5e3f081cd4cc |
| publicationDate | 2014-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-102643990-B |
| titleOfInvention | Method for removing trace Cu in high-purity Ni by chelate resin |
| abstract | The invention discloses a method for removing trace Cu in high-purity Ni by chelate resin. The method comprises the steps of: pretreating anolyte obtained by electrolyzing nickel sulfide to remove impurities including Fe, Co, Zn, Pb and the like so as to obtain 3N Ni electrolyte containing trace impurity Cu; pumping the 3N Ni electrolyte into an adsorption tower filled with the chelate resin so as to obtain a Ni solution with the purity higher than 5N and 4N; and after the adsorption tower reaches a leakage point, stopping water supply, and carrying out regeneration treatment by a regenerant, wherein the regeneration rate approximately equals to 100%.The method can be used for removing trace Cu in high-purity Ni, thus the purity of Ni is increased by more than one order of magnitude in high efficiency and low consumption, and other impurities are not introduced, and secondary pollution is not caused. The method disclosed by the invention has remarkable economic benefit and wide application prospect. |
| priorityDate | 2012-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 38.