http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102603207-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d6a6f422b091ba12ea61d4adbf1b0e8e |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-245 |
| filingDate | 2012-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c631a4793f9ab128ae4903c1e4f55e1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da28f99e7eb2d94f6ffdf2e47bb5d312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc26d81db9cce6fd0e222a470643d8d1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d14331b035cace8175a13ffc4cd6ea1f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fd72da5bd18af9c9afb2941a8cae987 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93acb09dc0731dcba1a5cbcaa7db5af4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2c5a73bd0318e0c11f436fe665cf505 |
| publicationDate | 2014-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-102603207-B |
| titleOfInvention | Method for growing fluorine-doped stannic oxide thin film with micro-nano structure on glass substrate |
| abstract | The invention discloses a method for growing a fluorine-doped stannic oxide thin film with a micro-nano structure on a glass substrate. The method is implemented as follows: the glass substrate which is cleaned is placed in a vapor-deposition reaction chamber; an organic tin source and an organic fluorine source (which are precursors) utilize nitrogen as carrier gas, a catalyst H2O utilizes air as carrier gas, the nitrogen and the air are gasified in a bubbler respectively and then are introduced into a gas mixing chamber; the obtained mixed reaction gas is introduced into a film coating reactor to be conveyed on the glass substrate, the distance between an air jet hole in the film coating reactor and the glass surface is controlled to be 2-5mm, and the mass ratio of Sn to F in the organic air source is (2:1)-(3:1), and the mixed reaction gas is deposited on the surface of the glass substrate for 5-30s, and cooling. According to the method, the preparation process is simple, the used devices are simple, the environment is not polluted, the cost is low, the efficiency is high, the energy consumption is low, and the method is suitable for producing large-area transparent conductive films on line by float process; and the prepared fluorine-doped stannic oxide thin film with the micro-nano structure has good visible light transmission rate and good intermediate and far infrared reflectivity. |
| priorityDate | 2012-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 40.