http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102575127-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_730848fc69ca7afca2b3c3e10b6cfd92 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D167-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D167-00 |
| filingDate | 2010-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_823a50a899fad4e6a351fe7fa1eb408d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1da9cd479d513108dbf1461de4c0dcc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56ee2c37be67a377d8a3af0a8b0b58d8 |
| publicationDate | 2014-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-102575127-B |
| titleOfInvention | Antifeflective composition for photoresists |
| abstract | The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1, wherein X is a linking moiety selected from a nonaromatic (A) moiety, aromatic (P) moiety and mixture thereof, R' is a group of structure (2), R'' is independently selected from hydrogen, a moiety of structure (2), Z and W-OH, wherein Z is a (C1-C20) hydrocarbyl moiety and W is a (C1-C20) hydrocarbylene linking moiety, and, Y' is independently a (C1-C20) hydrocarbylene linking moiety, wherein structure (2) is shown in the description, where R1 and R2 are independently selected from H and C1-C4alkyl and L is an organic hydrocarbyl group. The invention further relates to a process for imaging the antireflective coating composition. |
| priorityDate | 2009-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 226.