| abstract |
The present invention relates to a dry film photoresist. In detail, the dry film photoresist according to the present invention enables a process of exposure to light to be performed when a base film is removed, and prevents the adverse effects of exposure to light caused by a base film, to thereby improve resolution. Further, the dry film photoresist of the present invention is advantageous in that transparency may not be deteriorated by a resin protection layer or a developing velocity may not be lowered by the resin protection layer even when a process of exposure to light is performed in the presence of the resin protection layer, thus achieving a high resolution. |