http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102516875-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b4711b7defc1422cdb7f86d2c95657bf |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F3-06 |
| filingDate | 2011-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1988b762099310ccdc751b8ec23a7842 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a20b0c833781ab36e66d3dbc25acebb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a943e879c143c900e87b9ecb2b8f20f4 |
| publicationDate | 2014-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-102516875-B |
| titleOfInvention | Polishing solution based on polishing process of metal Co and application thereof |
| abstract | The invention discloses a polishing solution based on a polishing process of metal Co and application thereof. The polishing solution comprises the following raw material components in percentage by weight: 0.01-2% of inhibitor, 0-5% of oxidant, 0.1-10% of grinding granules, 0.001-10% of chelating agent and the balance of water, wherein the pH value of the polishing solution is adjusted to 3-5 by a pH value adjusting agent; the inhibitor is selected one or more of five-membered heterocyclic ring derivatives containing S and/or N; the oxidant is selected from one or more of hydrogen peroxide, ammonium persulfate, potassium periodate and potassium perchlorate; the grinding granules are selected from one or more of silicon dioxide, cerium dioxide and alumina; and the chelating agent is selected from amino acid or citric acid or a mixture thereof. The polishing solution disclosed by the invention can effectively inhibit the static corrosion of cobalt, reduce the polishing rate of cobalt and prevent the over-corrosion of cobalt in the polishing process. |
| priorityDate | 2011-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 70.