http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102505118-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_536e7e618c01b9ec3ea9eeb0f0e7c1ad |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-26 |
| filingDate | 2011-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94be27a9661d3f92761cbbaa0347d00a |
| publicationDate | 2014-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-102505118-B |
| titleOfInvention | OLED (organic light emitting diode) chromium etchant, preparation method for same and application thereof |
| abstract | The invention discloses OLED (organic light emitting diode) chromium etchant, a preparation method for same and application thereof. The chromium etchant comprises ammonium cerium nitrate, nitric acid solution, cationic surfactant and water, where, by total weight percentage of the etchant, the ammonium cerium nitrate accounts for 5-30%, preferably 10-20%, the nitric acid solution accounts for 0.5-10%, preferably 1-5%, the cationic surfactant accounts for 0.01-5%, preferably 0.1-1%, and the balance is the water. The OLED chromium etchant can be used for etchant in absence of etch-resistant coating penetration, speed of etching chromium films is increased evidently, etching can be performed when the chromium films are controlled well and no etch-resistant coating penetration occurs, and accordingly, high-precision smooth metallic film electrodes or wires can be obtained, and important application value is realized. |
| priorityDate | 2011-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.