| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D211-44 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D211-44 |
| filingDate |
2010-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad6f2018726d7b9d9323115f7bc3ecc3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a7f370388bbd092746549722b253007 |
| publicationDate |
2014-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-102483574-B |
| titleOfInvention |
Radiation-sensitive resin composition and compound |
| abstract |
Disclosed are: a radiation-sensitive resin composition which fulfils both exposure latitude and MEEF performance,and a compound which can be used suitably in the radiation-sensitive resin composition. The radiation-sensitive resin composition comprises: (A) a compound having such a structure that a group represented by formula (1) is bound to a nitrogen atom,(B) a resin which has an acid-dissociative solubility-suppressing group and of which the alkali solubility can be increased by the action of an acid,and (C) a radiation-sensitive acid-generating agent. |
| priorityDate |
2009-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |