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filingDate 2010-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2018-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-102481723-B
titleOfInvention The method for forming photon crystal material
abstract Provide a kind of method for forming photon crystal material film.To that can have the material of photon crystal structure to implement the first process, the process deforms material, so as to form such film, wherein the incident light received by the material is selectively reflected or transmitted so as to produce the first optical effect in the film.Second process is implemented to substantially whole film, the process applies shear stress to the film.This causes the change of material structure, so as to produce the second optical effect different from first optical effect in the film in response to incident light.It also discuss safety diaphragm, device, product and the file formed using methods described.
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