http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102422398-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S134-902 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2010-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fedda0b37df981aaeb335262229fd1d1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6db3aadda7905951711d8993122e3cb8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9bfe31eba69d6b134cc2b66b7b7d9909 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4e2ed342294e7a9a49f21b31a30088e8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9ba934327ffdca3d286eb8935a042e6 |
| publicationDate | 2014-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-102422398-B |
| titleOfInvention | Apparatus and system for cleaning substrate |
| abstract | An upper processing head includes a topside module defined to apply a cleaning material to a top surface of a substrate and then expose the substrate to a topside rinsing meniscus. The topside module is defined to flow a rinsing material through the topside rinsing meniscus in a substantially uni-directional manner towards the cleaning material and opposite a direction of movement of the substrate. A lower processing head includes a bottomside module defined to apply a bottomside rinsing meniscus to the substrate so as to balance a force applied to the substrate by the topside rinsing meniscus. The bottomside module is defined to provide a drain channel for collecting and draining the cleaning material dispensed from the upper processing head when the substrate is not present between the upper and lower processing heads.; The upper and lower processing heads can include multiple instantiations of the topside and bottomside modules, respectively. |
| priorityDate | 2009-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6971089 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419576105 |
Total number of triples: 21.