http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102375327-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8f823f036721e39c61ff0ced537273b8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c1e3d8364bf64e4ac6e1a9cd5df2bd54 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-48 |
| filingDate | 2010-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3a5e9687726ac3834e0d828d4cc1807 |
| publicationDate | 2014-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-102375327-B |
| titleOfInvention | Embedded-attenuated phase shift mask and its manufacturing method |
| abstract | The invention relates to an embedded-attenuated phase shift mask and its manufacturing method. The embedded-attenuated phase shift mask comprises a transparent substrate, a phase shift layer formed on the surface of the transparent substrate, a light shielding layer formed on the surface of an area without a chip pattern in the phase shift layer, and an isolating layer formed on the surface of the light shielding layer, and chip patterns in a chip pattern equipped area in the phase shift layer. The embedded-attenuated phase shift mask and its manufacturing method of the invention can prevent haze generation effectively, and have the advantages of fewer processes and low production cost. |
| priorityDate | 2010-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.