http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102368837-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d9de52bba13e16028dffa8775e3f3f28 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H04R19-04 |
| filingDate | 2011-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3739e9f929c845498a693aa0cbc7e4b6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36d21d00d801639134298efac2b84d0c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f0c49b29f7bdf14b76a63df7db5541d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6cea2055ecdea1e7fd8a4d8173b81a12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c42bbcbf1a2e23d51c9b7a14cfce19fe http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_846e1b751fe30c631280105cc95ddfac |
| publicationDate | 2014-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-102368837-B |
| titleOfInvention | Capacitance type microphone based on surface micro-machining process and preparation method thereof |
| abstract | The invention provides a capacitance type microphone based on a surface micro-machining process and a preparation method thereof. The preparation method comprises the following steps of: utilizing a wet-method etching process based on a reaction ion etching and taking HF (Hydrogen Fluoride) as an etching solution; forming a structure with a high ratio of depth to width and a squared cavity structure with vertical side walls by using a reaction ion dry-etching method; then utilizing the wet-method etching of etching solution HF to etch a phosphorosilicate glass sacrificing layer between a vibration film and a fixed electrode film until the sacrificing layer is punched through to form a structure, which is internally hollow and provided with sound holes on the side walls, to support a vibration thin film on the structure, thereby utilizing the capacitance change to convert sound energy into electric energy. According to the invention, the sound holes are etched on the side walls of the structure of a microphone, complicated micro-machining technologies and accurate depositing processes are not needed and a gap distance between the vibration film and an electrode can be easier controlled; and the operation of the reaction ion dry-etching and the HF wet-method etching are relatively simple and the whole process flow is simple and feasible. |
| priorityDate | 2011-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.