Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-762 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105 |
filingDate |
2011-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2014-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d10c066f8f78607802c47b4467619242 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c54ef637626c06eeefc16ea474ad25a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4006e4f69daecf0f4e05e1cade7586f9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb9911eef1b7c41e44a37a9c8ec97fde |
publicationDate |
2014-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
CN-102363713-B |
titleOfInvention |
Stabilized chemical mechanical polishing composition and method of polishing substrate |
abstract |
A chemical mechanical polishing composition, comprising, as initial components: water; 0.1 to 40 wt % abrasive having an average particle size of 5 to 150 nm; 0.001 to 1 wt % of an adamarityl substance according to formula (II); 0 to 1 wt % diquaternary substance according to formula (I); and, 0 to 1 wt % of a quaternary ammonium compound. Also, provided is a method for chemical mechanical polishing using the chemical mechanical polishing composition. |
priorityDate |
2010-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |