http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102358824-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1b0e6fd2db5f8791ff0d2ab2f9646353 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0ee33b0e3e7398cf6fc957eeee59d510 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2eb97facd58745a89234cb58ac115cf1 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B29-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate | 2011-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_49357179f8d1716167f66859766d2ed6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e732b180cfd7b20cc81a6b91020c8fc2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61f2e2f8291190956859f9b21abb91a7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3aa0d8add5967a52428b59f181a606b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c1a6e717871200fa32cd91ad44222a34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5becd88d2c1c3450a2bdc6868cd7d8d |
| publicationDate | 2013-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-102358824-B |
| titleOfInvention | Polishing composition for ultra-precision surface manufacture of hard disk substrate |
| abstract | The invention discloses a polishing composition for ultra-precision surface manufacture of a hard disk substrate, and belongs to the technical field of computer memory hard disk manufacture. The polishing composition comprises an abrasive, one or more corrosive agents, one or more oxidizing agents and water. The polishing composition is characterized in that the polishing composition also comprises one or more stabilizing agents, one or more polishing promoters and one or more polishing poising agents; the polishing promoters are inorganic salts; and the polishing poising agents are organic acidic salts. The polishing composition provided by the invention is mainly suitable for ultra-precision polishing in hard disk substrate manufacture, and has the characteristic of a high polishing removal rate. A hard disk substrate treated by the polishing composition has a smooth surface, does not have the defect of pit and protrusion formation, and has surface roughness below 0.3 angstroms and surface waviness below 0.5 angstroms. The polishing composition can effectively eliminate micro-defect such as surface micro-scratch, polishing traces and the like. The polishing composition is suitable for ultra-precision surface manufacture of a nickel and phosphor plated aluminum alloy substrate, a glass substrate and the like of a hard disk. |
| priorityDate | 2011-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 159.