http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102314083-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_75cdc24ceaf26ff98d93ac8ef922fac1 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate | 2010-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2b42fcbad79154dd2626f6083314f12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_33e8a25a95bec87bdaf57ab0419a903c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_952e28e23392329a303694a88672536e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5189f4bb43bf1b68f4d5d1899dc58244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59726e95d9c09102a7d9b334fa82e256 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07b12431fff0b3d1c5d7294947d6ca41 |
| publicationDate | 2013-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-102314083-B |
| titleOfInvention | Photosensitive composition adopting composite dissolution-resistant agent/dissolution inhibitor and application of same |
| abstract | The invention discloses a photosensitive composition adopting a composite dissolution-resistant agent/dissolution inhibitor, which comprises the dissolution-resistant agent/dissolution inhibitor, alkali soluble linear phenolic resin, an infrared absorbing dye, a background dye and a solvent, and the dissolution-resistant agent/dissolution inhibitor comprises a sulfonyl hydrazone compound and an ammonia amide salt. Since the chemical reaction type dissolution-resistant agent/dissolution inhibitor formed via compounding of the sulfonyl hydrazone compound and the ammonia amide salt is adopted, and the pH value of the prepared photosensitive composition, coating solution, for the thermosensitive CTP (cytidine triphosphate) plate changes little along with the time, the service life of the photosensitive composition, coating solution, is prolonged to be 7 days and even more than two weeks from 3-4 days when only the sulfonyl hydrazone compound is adopted, and the pH value of the photosensitive composition is still maintained higher than the initial pH value of the photosensitive composition, coating solution, prepared with the original proportion. The thermal sensitivity, resolution line width and developing tolerance of a thermosensitive layer obtained via coating and the storage stability of the plate are superior to or no interior to the effects when only the sulfonyl hydrazone compound is adopted. |
| priorityDate | 2010-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 68.