http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102303840-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d9de52bba13e16028dffa8775e3f3f28 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00 |
| filingDate | 2011-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ad0927a72537c58562f5fc3ae6fab7f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b619273062b0385706e5a0e454e9e718 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23e5e958576fc6fce63ddd1215e5e3f3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f157c0f457c418a20049296798b560c0 |
| publicationDate | 2014-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-102303840-B |
| titleOfInvention | Preparation method of nano-imprint template in vector type AFM (atomic force microscopy) nano processing system |
| abstract | The invention discloses a preparation method of a nano-imprint template in a vector type AFM (atomic force microscopy) nano processing system, and belongs to the technical field of nano manufacturing. The method comprises the following steps that: the vectorization programming is performed on a required nano structure to obtain a macro document to be processed to control the movement of a pinpoint; the AFM enters an imaging mode scanning state, then begins scanning a sample surface, enters a script program mode after the scanning procedure is stable and a stable scanning image with good repeatability is obtained, invokes and imports the macro document (to be processed) obtained in the third step to a processing system to process; and the AFM enters a real-time imaging mode after the processing is finished, scans again to obtain a surface topography structure image of a processed structure, and finally uses a prepared nano pattern structure as a mask to transfer the nano structure image prepared by the anodic oxidation induced by an AFM electric field by combining with a high-selectivity anisotropism wet etching technology so as to manufacture the nano structure template. |
| priorityDate | 2011-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.