| abstract |
The invention refers to a copolymer composition, a photolithography dielectric composition and electric or electron devices containing the photolithography dielectric composition. The copolymer composition includes a copolymer having repeat units of structural formula I: where X is selected from O, -CH2-, and -CH2-CH2-; m is an integer from 0 to 5; and each occurrence of R<1>-R<4 >are independently selected from H; C1 to C25 linear, branched, and cyclic alkyl, aryl, aralkyl, alkaryl, alkenyl and alkynyl that can include one or more hetero atoms selected from O, N, and Si; a group that contains an epoxy functionality; -(CH2)nC(O)OR<5>; -(CH2)nC(O)OR<6>; -(CH2)nOR<6>; -(CH2)nOC(O)R<6>; -(CH2)nC(O)R<6>; -(CH2)nOC(O)OR<6>; and any combination of two of R<1>, R<2>, R<3>, and R<4 >linked together by a linking group. A portion of the repeat units having structural formula I contain at least one epoxy functional pendant group. The copolymer composition can be included with a material that photonically forms a catalyst in a photodefinable dielectric composition, which can be used to form a photodefinable layer on a substrate. |