http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102250582-B

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eb4d79bbe93acb846f3a72b874747da1
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
filingDate 2011-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2013-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80418b3fe92b0d416f97661b27c6dd19
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_633f5cac23c85dab16cc4c94d0a6687c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb73b6c15f6a62304c25b3acf9db3641
publicationDate 2013-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-102250582-B
titleOfInvention Method for preparing submicron polycrystalline diamond abrasive with narrow particle size distribution
abstract The invention relates to a method for preparing submicron polycrystalline diamond abrasive with narrow particle size distribution, which comprises the following steps: (1) preparing pulp; (2) reshaping; and (3) centrifugally grading. In the invention, a submicron diamond product can be prepared by reshaping polycrystalline diamond powder of a particle size of 0.5 to 10 micrometer in a planet mill, superfine mill or supersonic pneumatic mill and grading in a high-speed centrifugal machine, wherein the particle sizes of the product may be 0.125 micrometer, 0.25 micrometer, 0.5 micrometer, 0.75 micrometer, 1 micrometer and 1.5 micrometers. The performance of the product is represented by the narrow particle size distribution of the product and regular particle shape. The product of the method is very suitable for fine polishing of sapphire, precision ceramics, optical crystals and metal molds; and after a sapphire wafer for an LED substrate is polished by the 0.5-micrometer diamond prepared by the method, the surface roughness of the sapphire wafer is 2.81 nanometers. The method is short in production period and is convenient for enlarging production scale.
priorityDate 2011-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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