http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102227518-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e4c608a8531ea588aab7e23318e09a77 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3281 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02071 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J3-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23G1-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate | 2009-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53af2eb49c29cfeb66450fa31ad3f40f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_891fc2c98638ea1bad069b120cad22f6 |
| publicationDate | 2015-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-102227518-B |
| titleOfInvention | Fluorine contained composition and application thereof |
| abstract | A fluorine contained composition which contains a fluoride compound, a polyvinyl-pyrrolidone type polymer and a carrier is disclosed. The disadvantage of high corrosion rate on the polycrystal silicon due to the conventional fluorine contained composition can be eliminated. By adding the selected polyvinyl-pyrrolidone type polymer that is applicable in a fluorine contained system, a fluorine contained composition is provided which can effectively inhibit the corrosion rate of polycrystal silicon. The applications of the fluorine contained composition in the field of semiconductor wafer cleanning, mechannical polishing and wet-etching, solar battery etc. can be further developed. The application of the composition in cleaning semiconductor wafer is also disclosed. |
| priorityDate | 2008-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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