Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-1063 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2885 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-288 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-288 |
filingDate |
2009-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2014-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_677a21db4f7f686498c3a92f526d4be0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_16ff1d14e771ab2da9dde1eafaedbc02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fcc14f7c726260a2109d5a75cb3474b1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8193492c0af36398d5eebe58a3e07c4 |
publicationDate |
2014-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
CN-102224574-B |
titleOfInvention |
Bottom up plating by organic surface passivation and differential plating retardation |
abstract |
Embodiments of the present invention generally relates to an apparatus and a method for processing semiconductor substrates. One embodiment provides a method provides a method for processing a substrate comprising forming a seed layer over a substrate having trench or via structures formed therein, coating a portion of the seed layer with an organic passivation film, and immersing the trench or via structures in a plating solution to deposit a conductive material over the seed layer not covered by the organic passivation film. |
priorityDate |
2008-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |