| abstract |
Provided is a substrate for super-conductive film formation. The substrate comprises a metal substrate and, formed directly on top of the metal substrate, an oxide layer of primarily chromium oxide having a layer thickness of 10 to 300 nm and a surface smoothness Ra of 50 nm or less. Also provided is a method for producing a substrate for super-conductive film formation, comprising a step for forming an oxide layer, which has a layer thickness of 10 to 300 nm and a surface smoothness Ra of 50 nm or less, directly on top of a metal substrate. |