| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8fb9f44db08d1c42a53f3d28eaae416f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B29-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-8404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C19-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C19-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84 |
| filingDate |
2009-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c21364f1fab1cd2b90456c96e3fc39a0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd79976d365387f2862b87fdf00b7127
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4c73a7af00681318a865d3b6d5fbbb0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a43e12bf1e1e14b585693f3a34149aa4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f3f4949a2345f7a187b8780582ff500 |
| publicationDate |
2015-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-102209765-B |
| titleOfInvention |
Polishing liquid composition for magnetic disk substrate |
| abstract |
Disclosed is a polishing liquid composition for a magnetic disk substrate that can reduce scratches and surface roughness of the substrate after polishing without sacrificing productivity. Also disclosed is a method for manufacturing a magnetic disk substrate using the polishing liquid composition. The polishing liquid composition comprises a colloidal silica having a [Delta]CV value of 0 to 10% and water. The [Delta]CV value is defined by equation [Delta]CV = CV30 - CV90 wherein CV30 represents a value obtained by dividing a standard deviation based on a scattering intensity distribution at a detection angle of 30 DEG by a dynamic light scattering method by the average particle diameter based on the scattering intensity distribution and multiplying the obtained value by 100; and CV90 represents a value obtained by dividing a standard deviation based on a scattering intensity distribution at a detection angle of 90 DEG by the average particle diameter based on the scattering intensity distribution and multiplying the obtained value by 100. |
| priorityDate |
2008-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |