http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102171268-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-12 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-3477 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L63-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L51-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-05 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G65-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-38 |
| filingDate | 2009-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-102171268-B |
| titleOfInvention | Photocurable composition and solidfied material |
| abstract | The object of the present invention is to provide a kind of solidification compound and solidfied material, this solidification compound can form the solidfied material with photo-curable and insulating properties excellence. Object of the present invention can realize by Photocurable composition, as the essential composition of described Photocurable composition, contain: modified polyorganosiloxanes compound, (B) (A) with optical polymerism functional group and SiH base has the compound of carbon-to-carbon double bond and (C) Photoepolymerizationinitiater initiater. There is excellent insulating properties with the film that solidification compound of the present invention is made. Solidification compound of the present invention can pass through solution coat film forming, therefore can be used as can solution film forming thin film dielectric material. |
| priorityDate | 2008-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 239.