| abstract |
The invention provides a salt and a photoresist composition containing the same. The salt represented by the formula (I): wherein R1 and R2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group which can have one or more fluorine atoms and in which one or more -CH2- can be replaced by -O- or -CO-, R3 represents a group having a cyclic ether structure, and Z1+ represents an organic cation. |