http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102159657-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_778fe5aa551806ca134b210927ef0eb8 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate | 2009-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb8d60b5c031984c4fd1549391d6039c |
| publicationDate | 2011-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-102159657-A |
| titleOfInvention | Chemical-mechanical polishing liquid |
| abstract | The present invention discloses a chemical-mechanical polishing liquid comprising abrasive particles, hydrogen peroxide,persulfate and water. The pH value of the liquid is 9 to 12. The chemical-mechanical polishing liquid according to the present invention has a high removal rate of tungsten. |
| priorityDate | 2008-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 53.