| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D201-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D201-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-08 |
| filingDate |
2009-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_507b2698b177d9d455fc5fc6b3dca1d7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af9c2e14ce70952e0584b06db3aadf71
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6770a3a481d801b51c9c1ee15d7c6363 |
| publicationDate |
2011-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-102124064-A |
| titleOfInvention |
Composition for forming silicon-containing resist underlayer film with onium group |
| abstract |
Provided is a composition for forming a resist underlayer film for lithography to form a resist underlayer film that can be used as a hard mask, can be used as an anti-reflective film, and has a higher dry-etching rate than a resist without intermixing with the resist. Specifically provided is a film-forming composition that comprises a silane compound with an onium group. The silane compound with an onium group is a film-forming composition that is a hydrolysable organosilane having an onium group in the molecule, hydrolysate thereof, or hydrolytic condensate thereof. The film-forming composition is a composition for forming a resist underlayer film for lithography and is a composition comprising a silane compound with an onium group and a silane compound without an onium group. The silane compound with an onium group is present in proportions of less than 1 mole%, for example, 0.01 to 0.95 mole% in the total silane compounds. The hydrolysable organosilane is represented by formula (1): R<1>aR<2>bSi(R<3>)4-(a+b). Resist underlayer films obtained by coating and baking the composition for forming resist underlayer film on a semiconductor substrate is also provided. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113891906-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115386377-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I684617-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107533302-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107533302-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110376848-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105916913-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105916913-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106062044-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106062044-A |
| priorityDate |
2008-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |