| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aa500b65158889515895fba070c7a370 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H2003-026
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-21 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-215
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-02118
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-02023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01C19-5628 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H03H9-215
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-29
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-253
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H03H9-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01C19-5628 |
| filingDate |
2009-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e31bcba4887ebc93460667390d927f59
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20f6814c64016ec7f5f1481e6a75498e |
| publicationDate |
2014-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-102089969-B |
| titleOfInvention |
Quartz oscillator manufacturing method |
| abstract |
Provided is a quartz oscillator manufacturing method whereby high-precision, fine adjustment can be realized without applying excessive force to a quartz oscillator, and whereby multiple quartz oscillators can be adjusted at one time. The quartz oscillator manufacturing method is characterized by comprising a first etching step to form a specified external shape, an electrode formation step to form electrodes on at least a part of the surface of the external shape, an amount-of-leakage measurement step to measure the amount of leakage due to leaked vibration from the external shape, and a second etching step to etch the external shape by an amount based on the measurement result of the amount-of-leakage measurement step in order to adjust the balance. |
| priorityDate |
2008-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |