http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102007581-B
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8711ea5c1b04a5bcf6e0a9686beb6686 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02363 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3063 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
filingDate | 2009-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2014-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfe14409cddec355aec76fb8b7789648 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_46ae1700ef5c3bb5ac3fc23643f146d6 |
publicationDate | 2014-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-102007581-B |
titleOfInvention | Anti-reflection etching of silicon surfaces catalyzed with ionic metal solutions |
abstract | A method (300) for etching a silicon surface (116). The method (300) includes positioning (310) a substrate (112) with a silicon surface (116) into a vessel (122). The vessel (122) is filled (330, 340) with a volume of an etching solution (124) so as to cover the silicon surface (116). The etching solution (124) includes a catalytic solution (140) and an oxidant-etchant solution (146), e.g., an aqueous solution of hydrofluoric acid and hydrogen peroxide. The catalytic solution (140) may be a solution that provides metal-containing molecules or ionic species of catalytic metals. The silicon surface (116) is etched (350) by agitating the etching solution (124) in the vessel (122) such as with ultrasonic agitation, and the etching may include heating (360) the etching solution (124) and directing light (365) onto the silicon surface (116). During the etching, the catalytic solution (140), such as a dilute solution of chorauric acid, in the presence of the oxidant-etchant solution (146) may release metal particles such as gold or silver nanoparticles that speed or drive the etching process. |
priorityDate | 2008-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 33.