| abstract |
The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by formula (C1), wherein R c2 represents C7 which may have one or more substituents -C20 aralkyl, and R c1 represents a group represented by formula (1), in formula (1), R c3 and R c4 each independently represent a hydrogen atom or straight chain, branched chain or cyclic C1-C12 An aliphatic hydrocarbon group, R c5 represents a C1-C30 divalent organic group, and R c3 and R c4 or R c5 may be combined with each other to form a ring together with the nitrogen atom to which R c3 and R c4 or R c5 are bound. |