http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101987391-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-3405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K10-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-3457 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K10-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K9-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K9-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K9-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-34 |
| filingDate | 2010-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-101987391-B |
| titleOfInvention | Embedded chip, plasma-based torch and plasma-based processing unit (plant) |
| abstract | The present invention is about a kind of embedded chip, plasma-based torch and plasma-based processing unit (plant), and that is, it is provided that a kind of can at full speed carry out the embedded chip of high-quality plasma-based processing, plasma-based torch and plasma-based processing unit (plant).Embedded chip is to possess the opening that the upper end mask in chip 1 accommodates electrode and plural electrode configuration space 1a, 1b, 1c of being extended by this opening initially towards the lower surface of chip, and be respectively communicated to each electrode configuration space and along be orthogonal to the diameter line of chip center's axle with distribution and towards the lower section in aforementioned lower end face with plural opening 4a, 4b, 4c of opening.Again, tool medium pore 5, electrode configuration space and opening 4a, 4b are on using central shaft as the circumference at center, equiangularly spacing is with distribution, opening 4a, 4b are to in the nozzle being parallel to the weld bond of diameter line and open, or electrode configuration space is always on front tip electrode configuration space 1a, the target configuration space 1b of more than and the rearward end electrode configuration space 1c comprising and being distributed in welding direction y. |
| priorityDate | 2009-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.