http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101876789-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b9dc74743c55f8fa8b192a2220e5bc55 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-1055 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate | 2010-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4af14539a060a5f6ce654c60c9ae8ed http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ba3308a7172087ff6cb90035150eda3 |
| publicationDate | 2013-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-101876789-B |
| titleOfInvention | Positive photo-sensitive resin composition and solidification film forming method using same |
| abstract | The invention provides a positive photo-sensitive resin composition and a solidification film forming method using the same with excellent sensitivity, residue film rate and storage stability, capable of forming the solidification film with excellent heat tolerance, adhesive ability and transmissivity by solidifying the composition, characterized in that: the positive photo-sensitive resin composition comprises a special styrene structure unit capable of generating the carboxylic group by dissociating the dissociation group and a resin being alkali insoluble or alkali poorly-insoluble and capable of changing into be alkali soluble after dissociating the dissociation group; a resin of a structure unit derived by a free radical polymerization monomer containing an epoxy group; a compound with more than two epoxy groups (not containing the resin of the structure unit formed by the free radical polymerization monomer containing the epoxy group) and a compound for generating the acid by irradiating the active ray with wavelength of more than 300nm. |
| priorityDate | 2009-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 321.