http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101872126-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-266 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-70 |
| filingDate | 2009-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-101872126-B |
| titleOfInvention | wet soluble lithography |
| abstract | A system to form a wet soluble lithography layer on a semiconductor substrate includes providing the substrate, depositing a first layer comprising a first material on the substrate, and depositing a second layer comprising a second material on the substrate. In an embodiment, the first material comprises a different composition than the second material and one of the first layer and the second layer includes silicon. |
| priorityDate | 2009-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 35.