http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101863787-B

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filingDate 2010-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2013-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce605cff968639354a1cc202830626bd
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publicationDate 2013-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-101863787-B
titleOfInvention Organic/inorganic hybrid photocuring moisture-proof material and preparation thereof
abstract The invention discloses an organic/inorganic hybrid photocuring moisture-proof material and preparation thereof. The moisture-proof material comprises a photopolymerisable quaternary ammonium salt compound with the following structural formula, wherein the photopolymerisable quaternary ammonium salt compound is used for preparing photopolymerisable organic soil; the photopolymerisable organic soil can be applied in the field of photocuring composite materials. The organic/inorganic hybrid photocuring moisture-proof material comprises the following components in part by weight: 45 to 65 parts of photoreactive resin comprising at least one unsaturated double bond, 35 to 55 parts of monomer comprising at least one unsaturated double bond, 3 to 5 parts of photoinitiator and 1 to 9 parts of the photopolymerisable organic soil. The photopolymerisable organic soil has few adding amount in the photopolymerisable composition and high dispersibility and can be cured rapidly to form a nano-grade stripping structure, so the organic/inorganic hybrid photocuring moisture-proof material has the advantages of effective moisture-proof effect and wide application prospect in the field of the photocuring organic/inorganic hybrid materials.
priorityDate 2010-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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