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filingDate 2009-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2015-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2015-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-101799626-B
titleOfInvention For the technological process control of modifying polymer film surface interaction
abstract The invention provides a kind of method of modifying of polymer film surface interaction character.In the method, polymer support object Chemical composition that covers, and this Chemical composition that comprises photopolymerizable compound, light trigger or can the catalyzer of initiated polymerization and half fluorinated molecule.The polymeric molds produced thus contains half fluorochemical portion, on the surface that this half fluorochemical portion is mainly positioned at patterned surface and near-surface region.Polymeric molds is suitable as the template in nano imprint photoetching process with modification properties.
priorityDate 2008-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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