http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101788767-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d7a656d81749db852d747166f935dd7a |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-1055 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate | 2010-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3bcba255059cf054748c2fddbc9d9a4e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eed068774a4345405fdc7185feae709c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a2b1f30d86227be7efdea414bf53c3d |
| publicationDate | 2013-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-101788767-B |
| titleOfInvention | Radiation sensitive linear resin composition and layer insulation film and manufacture method thereof |
| abstract | The invention relates to a radiation sensitive linear resin composition, a layer insulation film and a manufacture method thereof. The radiation sensitive linear resin composition also displays the excellent film thickness uniformity and has high ray sensibility even thought a slot mold coating method as the coating method. In a developing step, the development tolerance of a good pattern shape is still formed even though exceeding the best developing time. The layer insulation film has various excellent performances such as high heat endurance, high solvent resistance, high transmittance and low dielectric constant. The radiation sensitive linear resin composition comprises (A)alkali soluble resin, (B) 1,2-quinone-bi-azide compound and (C) special polymer with siloxane chain. The layer insulation film is formed by the radiation sensitive linear resin composition. |
| priorityDate | 2009-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 333.