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filingDate 2008-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cee45fca7fd3c44819e019e1f59e0ee1
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publicationDate 2010-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-101689480-A
titleOfInvention System for continuously using resist stripper liquid based on nanofiltration
abstract The object of the invention is to realize a system in which a resist stripper liquid used in resist stripping is regulated so as to have a resist component concentration within a certain concentrationrange even when the resist stripper liquid is continuously used for long without replacing it. In stripping a positive resist with a stripper liquid, the resist components which have dissolved in thestripper liquid can be diminished by cross-flow filtration with a specific ceramic filter (5). In the resist stripping system, a resist-component-containing stripper liquid resulting from a strippingstep is treated in a filtration step, and the resultant concentrated stripper liquid having a heightened resist-component concentration is suitably discharged from the system. A fresh stripper liquidis suitably added to the stripper liquid from which the resist components have been removed, and the resultant stripper liquid is reused in the stripping step.
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priorityDate 2007-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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