| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31616
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2201-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2203-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2203-46 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-1469
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B23-0026
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-1453 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B20-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B8-04 |
| filingDate |
2009-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b299bd19b4744fb2c228f51fb7e227ea
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82773856e32b109ccb005309603f2774 |
| publicationDate |
2013-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-101639624-B |
| titleOfInvention |
Titania-doped quartz glass member and making method |
| abstract |
The present invention relates to a titania-doped quartz glass member and a preparing method. The quartz glass member has a surface where EUV light of up to 70 nm wavelength is reflected, a refractive index distribution in the surface has only one extreme point within a central 80% region of the member. The titania-doped quartz glass member has a surface with a high level of precision and thus can be formed into an EUV lithography photomask substrate which is improved in flatness and thermal expansion properties. The preparing method of the quartz glass member comprises: providing titania-doped quartz glass billet; keeping the billet for 1 to 200h at 700 to 1300DEG C to anneal; slowly cooling the billet at the speed of 1 to 20DEG C/h to 500DEG C; putting the billet in a forming crucible rotating in a furnace, the temperature distribution of the furnace has at least 1.5 DEG C/cm of temperature gradient at 1700DEG C; and heating the titania-doped quartz glass in the crucible. |
| priorityDate |
2008-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |