| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67034
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F26B21-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F26B5-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2007-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99b59cb2746e6ff3eb225e11b01d68ba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb32e01f1afe2bbd36c3cb19a34bb85d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25635a634212abe98b0f7f2c7038b2fb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bcf15816e70454d3ee7be2f405119ca7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_511115ebe68002713074d3c91606a4e3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ddb224eb4990e0eeaa9d9bf484ce5472
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63c13a9a4ba2cfa83e5ba473ed9bebb4 |
| publicationDate |
2010-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-101622694-A |
| titleOfInvention |
Use surface tension to reduce the method and apparatus of gas drying crystal wafer |
| abstract |
Disclose a kind of method with the proximity heads treatment substrate.This method starts from, and head is provided, and it has the head surface near the surface of this substrate.This head has width and length, and this has the port that a plurality of length along this become many row arrangement.Should many rows spread all over this width, and the first group of port that is configured to distribute first fluid arranged.With this first fluid be dispensed to this substrate this surface in case this substrate should the surface and this surface of this head between form meniscus.This method also comprises from this interface of second group of port between this meniscus and this substrate carries gaseous carbon dioxide.This carbon dioxide assists to promote to reduce the surface tension of this meniscus with respect to this substrate surface. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107115822-A |
| priorityDate |
2006-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |