| abstract |
A cleaning composition for removing photoresist includes a corrosion inhibitor and a solvent. The corrosion inhibitor includes two types of compounds: one type of the compound being alkyl alcohol monoaryl ether, the other type of the compound selecting from a phenolic compound, carboxylic acid, polyocarboxy acid, carboxylate, polycarboxylate compound, anhydride, polyanhydride and/or phosphinic ac id, phosphonate ester compound. |