http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101523291-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-114 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-128 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2007-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e3e0d28b84fd7ef6f4c04f4e508f192 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1758cb70ffb9c72525dd4f020b9922e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1a06d98c4fa9b1579160dcfe4f367c6 |
| publicationDate | 2009-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-101523291-A |
| titleOfInvention | Process for semiconductor device production using under-resist film cured by photocrosslinking |
| abstract | The invention provides a composition for under-resist film formation which is for use in a lithographic process for producing a semiconductor device. Also provided is a process for producing a semiconductor device which includes: a step in which a composition for under-resist film formation comprising a polymer, a crosslinking agent, and a photo-acid generator is applied to a semiconductor substrate to form a coating film; a step in which the coating film is irradiated with light to form a lower-layer film; and a step in which a composition for photoresist formation is applied to the lower-layer film and heated to form a photoresist. The polymer is a polymer having benzene rings and heterocycles in the backbone constituting the polymer or in side chains bonded to the backbone. The polymer may have a benzene ring content of 30-70 mass%. The polymer may contain a lactone structure. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104765252-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113226511-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106715619-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106715619-A |
| priorityDate | 2006-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 242.