| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_298defbfd57374f2f9c2582ef9e9abc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32137
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6708
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2007-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b73116db9c2290c34c180360cdab960d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8353348086508fb5f4745f9a9ec7d74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da675c05d03371a0fb6d16d0c278f538 |
| publicationDate |
2013-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-101473415-B |
| titleOfInvention |
Edge gas injection for critical dimension uniformity improvement |
| abstract |
A method of etching a semiconductor substrate with improved critical dimension uniformity comprises supporting a semiconductor substrate on a substrate support in an inductively coupled plasma etch chamber; supplying a first etch gas to a central region over the semiconductor substrate; supplying a second gas comprising at least one silicon containing gas to a peripheral region over the semiconductor substrate surrounding the central region, wherein a concentration of silicon in the second gas is greater than a concentration of silicon in the first etch gas; generating plasma from the first etch gas and second gas; and plasma etching an exposed surface of the semiconductor substrate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105814244-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105814244-B |
| priorityDate |
2006-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |