http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101246310-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2c27f4a786895417d03d0b1045587100 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-138 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-13 |
| filingDate | 2008-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_610a70669759a196f1767a604a02886f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10b1462fa7b87f5d4c23308cda78ca4e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a8dbf86c522b2f667469d7e883278b0e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd11018528e82059293caaf2b06db16f |
| publicationDate | 2008-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-101246310-A |
| titleOfInvention | Negative fluorine-contained photoresist composition and its application in polymer optical waveguide device |
| abstract | The invention belongs to optical waveguides device field, particularly relates to a negativity photoresist composition containing fluorine capable of using as polymers optical waveguides material and its application in preparing polymers optical waveguides device. The negativity photoresist composition containing fluorine contains 5.0-7.001920598hoto-induced acid-preparing object, 50.0-75.0 2.124886e-314poxy resins containing fluorine shown as formula (1) and 20.0-45.0wt% solvent by weight, R is chloridization (CCL2) or no-chloridization (CH2) methyl radical, n is 1-8. Because partly hydrogen atoms are superseded by fluorine atomics in epoxy resins containing fluorine, the absorption in communicating wave range is very small and the epoxy resins containing fluorine can be used as polymers optical waveguides material for preparing optical waveguides device. The photoresist composition can expose and form image to prepare optical waveguides device in ultraviolet wavelength range of 200-400nm and also can adjust exposal wavelength through changing kinds of photo-induced acid-preparing object. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103646672-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2564425-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102323717-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102323717-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101900941-A |
| priorityDate | 2008-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 62.