| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eccd894c99fea2d1c0c8735872bb2309 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-547
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1804
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-3411
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-23 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-00 |
| filingDate |
2006-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29a883c1be374872299a1d5a0c00054f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f24c76b0bdf86f42f5f008e472f07384 |
| publicationDate |
2008-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-101218184-A |
| titleOfInvention |
Combined etching and doping media for silicon dioxide layers and subjacent silicon |
| abstract |
The invention relates to HF/fluoride-free etching and doping media which are suitable for etching silicon dioxide layers and doping subjacent silicon layers. The invention also relates to a method in which said media are used. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102986004-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101777606-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102986004-B |
| priorityDate |
2005-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |