| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73ebc284a55d5daf0e209d6186c9e65c |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2443
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2431 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2406
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2443
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2431
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
| filingDate |
2007-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96f4a7da55f65a3b3ca5e04a2c1338f6 |
| publicationDate |
2008-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-101207966-A |
| titleOfInvention |
Plasma processing apparatus |
| abstract |
A plasma processing apparatus includes: a first electrode including a hollow penetrated through from an upper end thereof to a lower end thereof; a workpiece stage to place a workpiece; a second electrode arranged opposing to a lower end of the first electrode through the workpiece stage; a processing gas nozzle formed on an outer circumference side of an opening at the lower end of the hollow along a circumferential direction; a power source circuit including a power source applying a voltage between the first electrode and the second electrode; and a gas supply system supplying a processing gas to generate plasma to the processing gas nozzle. The plasma is generated by activating the processing gas that is ejected out of the processing gas nozzle and located around immediately below the opening at the lower end upon voltage application between the first electrode and the second electrode so as to process a surface of the workpiece by the plasma. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114430935-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103403536-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103403536-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103098183-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112334599-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112334599-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107303653-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9791410-B2 |
| priorityDate |
2006-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |